Suppression of phase separation of AlGaN during lateral growth and fabrication of high-efficiency UV-LED on optimized AlGaN
Phase separation of AlGaN is found to occur during growth on periodically trenched GaN, and it sometimes causes crack formation. The rate of separation can be suppressed by decreasing NH 3 flow rate in the gas phase. We can optimize the growth condition for AlGaN growth, thereby fabricating UV-LED w...
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Published in: | Journal of crystal growth Vol. 237; pp. 951 - 955 |
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Main Authors: | , , , , , , , |
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Language: | English |
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01-04-2002
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Abstract | Phase separation of AlGaN is found to occur during growth on periodically trenched GaN, and it sometimes causes crack formation. The rate of separation can be suppressed by decreasing NH
3 flow rate in the gas phase. We can optimize the growth condition for AlGaN growth, thereby fabricating UV-LED with an emission wavelength of 352
nm and output power of 0.6
mW at 50
mA. |
---|---|
AbstractList | Phase separation of AlGaN is found to occur during growth on periodically trenched GaN, and it sometimes causes crack formation. The rate of separation can be suppressed by decreasing NH
3 flow rate in the gas phase. We can optimize the growth condition for AlGaN growth, thereby fabricating UV-LED with an emission wavelength of 352
nm and output power of 0.6
mW at 50
mA. |
Author | Kamiyama, Satoshi Sano, Tomoaki Ukai, Tsutomu Iwaya, Motoaki Terao, Shinji Akasaki, Isamu Amano, Hiroshi Nakamura, Ryo |
Author_xml | – sequence: 1 givenname: Motoaki surname: Iwaya fullname: Iwaya, Motoaki email: d3002001@ccmailg.meijo-u.ac.jp organization: Department of Electrical and Electronic Engineering, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 2 givenname: Shinji surname: Terao fullname: Terao, Shinji organization: Department of Electrical and Electronic Engineering, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 3 givenname: Tomoaki surname: Sano fullname: Sano, Tomoaki organization: Department of Electrical and Electronic Engineering, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 4 givenname: Tsutomu surname: Ukai fullname: Ukai, Tsutomu organization: Department of Electrical and Electronic Engineering, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 5 givenname: Ryo surname: Nakamura fullname: Nakamura, Ryo organization: Department of Electrical and Electronic Engineering, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 6 givenname: Satoshi surname: Kamiyama fullname: Kamiyama, Satoshi organization: Department of Materials Science and Engineering, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 7 givenname: Hiroshi surname: Amano fullname: Amano, Hiroshi organization: Department of Materials Science and Engineering, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 8 givenname: Isamu surname: Akasaki fullname: Akasaki, Isamu organization: Department of Materials Science and Engineering, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan |
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Cites_doi | 10.1143/JJAP.39.L387 10.1143/JJAP.38.L1515 10.1143/JJAP.38.L487 10.1063/1.96549 10.1143/JJAP.28.L2112 10.1143/JJAP.27.1156 10.1149/1.2086742 10.1016/S0169-4332(00)00088-X |
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Keywords | 85.60.Jb B3. Light emitting diodes B1. Nitrides A1. Stresses A3. NH 3 flow rate A1. Phase separation A1. LT-interlayer 81.05.Ea |
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Snippet | Phase separation of AlGaN is found to occur during growth on periodically trenched GaN, and it sometimes causes crack formation. The rate of separation can be... |
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SubjectTerms | A1. LT-interlayer A1. Phase separation A1. Stresses A3. NH 3 flow rate B1. Nitrides B3. Light emitting diodes |
Title | Suppression of phase separation of AlGaN during lateral growth and fabrication of high-efficiency UV-LED on optimized AlGaN |
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