High-quality ZnO films grown by atmospheric pressure metal– organic chemical vapor deposition
High-quality ZnO films grown by atmospheric pressure metal–organic chemical vapor deposition (AP-MOCVD) are demonstrated in this paper. Surface morphology, structural quality and optical properties of the As-grown films were investigated by AFM, double-crystal XRD and photoluminescence (PL) measurem...
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Published in: | Journal of crystal growth Vol. 283; no. 1-2; pp. 87 - 92 |
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Main Authors: | , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Amsterdam
Elsevier B.V
15-09-2005
Elsevier |
Subjects: | |
Online Access: | Get full text |
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Summary: | High-quality ZnO films grown by atmospheric pressure metal–organic chemical vapor deposition (AP-MOCVD) are demonstrated in this paper. Surface morphology, structural quality and optical properties of the As-grown films were investigated by AFM, double-crystal XRD and photoluminescence (PL) measurements. The effect of buffer layers grown at different temperature on the film quality was studied. It was found that the low-temperature buffer layer was effective to improve the surface morphology, but was not effective to improve the structural quality. On the other hand, the high-temperature buffer layer can greatly improve the structural quality, but yields a relatively rougher surface. Both the samples deposited using either a low-temperature or high-temperature buffer layer showed strong UV luminescence at room-temperature. A fine structure of free excitons was observed at 11K in the sample with a high-temperature buffer layer. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0022-0248 1873-5002 |
DOI: | 10.1016/j.jcrysgro.2005.05.040 |