High-quality ZnO films grown by atmospheric pressure metal– organic chemical vapor deposition

High-quality ZnO films grown by atmospheric pressure metal–organic chemical vapor deposition (AP-MOCVD) are demonstrated in this paper. Surface morphology, structural quality and optical properties of the As-grown films were investigated by AFM, double-crystal XRD and photoluminescence (PL) measurem...

Full description

Saved in:
Bibliographic Details
Published in:Journal of crystal growth Vol. 283; no. 1-2; pp. 87 - 92
Main Authors: Wang, Li, Pu, Yong, Fang, Wenqing, Dai, Jiangnan, Chen, Yufeng, Mo, Chunlan, Jiang, Fengyi
Format: Journal Article
Language:English
Published: Amsterdam Elsevier B.V 15-09-2005
Elsevier
Subjects:
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:High-quality ZnO films grown by atmospheric pressure metal–organic chemical vapor deposition (AP-MOCVD) are demonstrated in this paper. Surface morphology, structural quality and optical properties of the As-grown films were investigated by AFM, double-crystal XRD and photoluminescence (PL) measurements. The effect of buffer layers grown at different temperature on the film quality was studied. It was found that the low-temperature buffer layer was effective to improve the surface morphology, but was not effective to improve the structural quality. On the other hand, the high-temperature buffer layer can greatly improve the structural quality, but yields a relatively rougher surface. Both the samples deposited using either a low-temperature or high-temperature buffer layer showed strong UV luminescence at room-temperature. A fine structure of free excitons was observed at 11K in the sample with a high-temperature buffer layer.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0022-0248
1873-5002
DOI:10.1016/j.jcrysgro.2005.05.040