Nucleation of Microcrystallites in Phosphorus-Doped Si:H Films

Nucleation of Microcrystallites in Phosphorus-Doped Si:H Films

Structural properties of partially crystallized Si:H films prepared by glow discharge technique have been studied by Raman scattering and optical absorption spectra. The structure of the Si:H films is found to be a mixture of microcrystalline and amorphous phases. The volume fraction of a microcryst...

Full description

Saved in:
Bibliographic Details
Published in:Japanese Journal of Applied Physics Vol. 20; no. 2; p. L121
Main Authors: Mishima, Yasuyoshi, Hamasaki, Toshihiko, Kurata, Hiroyuki, Hirose, Masataka, Osaka, Yukio
Format: Journal Article
Language:English
Published: 01-01-1981
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Structural properties of partially crystallized Si:H films prepared by glow discharge technique have been studied by Raman scattering and optical absorption spectra. The structure of the Si:H films is found to be a mixture of microcrystalline and amorphous phases. The volume fraction of a microcrystalline part in the Si:H network was determined to be 0.37–0.58 on the basis of the effective-medium theory.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.20.L121