Deposition of high-resolution Carbon/Carbon multilayers on large areas for X-ray optical applications

• Published in: Applied physics. A, Materials science & processing Vol. 79; no. 4-6; pp. 1039 - 1042
• Main Authors: MENZEL, M, WEISSBACH, D, GAWLITZA, P, DIETSCH, R, LESON, A
• Format: Conference Proceeding Journal Article
• Language: English
• Published: Berlin Springer 01-09-2004
• Subjects: Carbon; Cross-disciplinary physics: materials science; rheology; Density; Deposition; Exact sciences and technology; Laser deposition; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Multilayers; Physics; Reflectivity; Resolution; Spectra; X-rays; Thin films; Interfaces; Multilayers; Roughness; Interdiffusion; Pulsed laser deposition; Optical materials; Performance; Carbon; Penetration depth
• ISSN: 0947-8396; 1432-0630
• DOI: 10.1007/s00339-003-2623-5

To synthesize X-ray optical multilayers showing both high resolution and high reflectivity spacer and absorber materials with low absorption coefficients for the desired spectral range are required. Simulations of C/C multilayers with different period thicknesses, d, and single layer densities, {/content/TMYNX9YD45ALUVEM/xxlarge1009.gif}, show that a reflectance R{/content/TMYNX9YD45ALUVEM/xxlarge8201.gif}([Cu]K{/content/TMYNX9 Y D45ALUVEM/xxlarge945.gif})>80% and a resolving power of about {/content/TMYNX9YD45ALUVEM/xxlarge955.gif}/{/content/TMYNX9YD45ALU V EM/xxlarge916.gif}{/content/TMYNX9YD45ALUVEM/xxlarge955.gif}{/cont e n t/TMYNX9YD45ALUVEM/xxlarge8776.gif}600 can be achieved for C/C layer stacks with d=3 nm and N=1000 periods.