Phase composition of Cr-C thin films deposited by a double magnetron sputtering system

Non‐reactive d.c. magnetron sputtering by two magnetron sources with inclined geometry was used for deposition of Cr–C thin films with C : Cr ratio in the range 0.08–2.40. The phase composition of the films was investigated by x‐ray diffraction, XPS, SEM and resistivity measurements. Four phase comp...

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Bibliographic Details
Published in:Surface and interface analysis Vol. 30; no. 1; pp. 544 - 548
Main Authors: Groudeva-Zotova, S., Vitchev, R. G., Blanpain, B.
Format: Journal Article Conference Proceeding
Language:English
Published: Chichester, UK John Wiley & Sons, Ltd 01-08-2000
Wiley
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Summary:Non‐reactive d.c. magnetron sputtering by two magnetron sources with inclined geometry was used for deposition of Cr–C thin films with C : Cr ratio in the range 0.08–2.40. The phase composition of the films was investigated by x‐ray diffraction, XPS, SEM and resistivity measurements. Four phase compositional regions were distinguished in the investigated large compositional range: films containing mainly microcrystalline Cr or Cr–C solid solution; films containing both the microcrystalline Cr phase and the stoichiometric Cr23C6 carbide phase (β‐phase); amorphous‐like films composed of the ultradisperse Cr crystalline phase and different metastable carbides; and amorphous films consisting of a carbon matrix with a limited amount of a high‐carbon carbide phase dispersed in it. The films from the first two regions exhibit very high microhardness and good wear resistivity, and at the same time a relatively low electrical resistivity, which make them promising coating materials for electronic applications. Copyright © 2000 John Wiley & Sons, Ltd.
Bibliography:Foundation for Scientific Research, Flanders.
ark:/67375/WNG-7GJ6F6LG-G
ArticleID:SIA814
Bulgarian National Research Foundation - No. F-572/1995
istex:7DEDE7F10C8DB8C5FF5398BA8F8B876C4AFB5C45
ISSN:0142-2421
1096-9918
DOI:10.1002/1096-9918(200008)30:1<544::AID-SIA814>3.0.CO;2-7