Precision laser metallization

We demonstrate precision laser deposition of thin metal-film features on glass substrates. One micron deposits are produced with short, low-energy, laser pulses at a kilohertz rate. Numerous applications are expected for production of electrically conducting interconnects and vias on microelectronic...

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Bibliographic Details
Published in:	Microelectronic engineering Vol. 56; no. 3; pp. 273 - 279
Main Authors:	Tien, An-Chun, Sacks, Zachary S, Mayer, Frederick J
Format:	Journal Article
Language:	English
Published:	Amsterdam Elsevier B.V 01-08-2001 Elsevier Science
Subjects:	Applied sciences Electronics Exact sciences and technology Laser deposition Metal-film features Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Metal-film features Laser deposition Microelectronic fabrication Laser pulse Interconnection Metallizing Photolithography Flat panel displays Application Thin film Via hole
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Summary:	We demonstrate precision laser deposition of thin metal-film features on glass substrates. One micron deposits are produced with short, low-energy, laser pulses at a kilohertz rate. Numerous applications are expected for production of electrically conducting interconnects and vias on microelectronic substrates and for spot repairs on flat-panel displays and photolithographic masks.
Bibliography:	ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23
ISSN:	0167-9317 1873-5568
DOI:	10.1016/S0167-9317(00)00496-2