Explanation and correction of false step heights in amplitude modulation atomic force microscopy measurements on alkane films

• Published in: Ultramicroscopy Vol. 108; no. 9; pp. 946 - 952
• Main Authors: Bai, M., Trogisch, S., Magonov, S., Taub, H.
• Format: Journal Article
• Language: English
• Published: Netherlands Elsevier B.V 01-08-2008
• Subjects: Contact AFM; Non-contact AFM; Self-assembled monolayers; 68.37.Ps; Self-assembled monolayers; 68.43.Hn; Contact AFM; Non-contact AFM; 68.55.Jk; 87.64.Dz
• ISSN: 0304-3991; 1879-2723
• DOI: 10.1016/j.ultramic.2008.03.009

We use a prototypical alkane film (
n−C
32H
66 or C32) adsorbed on a SiO
2 surface to compare step heights measured by amplitude modulation atomic force microscopy (AM-AFM) with those measured in the contact mode. The C32 film exhibits layers in which the molecules are oriented with their long axis parallel to the SiO
2 surface followed by partial layers of perpendicular molecules. We show that step heights measured in the AM and contact modes agree in all cases except where the step is between a surface formed by a layer of parallel molecules and one of perpendicular molecules. In this case, the AM mode gives a false step height that is as much as 20% lower than that measured in the contact mode and inferred from synchrotron X-ray specular reflectivity measurements. We propose that the weaker van der Waals forces between the AFM tip and a perpendicular layer compared to a parallel layer causes this discrepancy. We show how to correct the false step height by using the approximately linear relationship observed between phase angle (cantilever oscillation relative to the drive signal) and cantilever height measured in an approach curve.