Miniature Ion Source KLAN-10M with a Plasma Neutralizer

• Published in: Surface investigation, x-ray, synchrotron and neutron techniques Vol. 13; no. 2; pp. 182 - 187
• Main Authors: Mikhaylenko, M. S., Pestov, A. E., Chkhalo, N. I., Goncharov, L. A.
• Format: Journal Article
• Language: English
• Published: Moscow Pleiades Publishing 01-03-2019; Springer Nature B.V
• Subjects: Apertures; Chemistry and Materials Science; Current distribution; Divergence; Ion beams; Ion current density; Ion currents; Ion optics; Ion sources; Materials Science; Optical components; Space charge; Surfaces and Interfaces; Thin Films; ion etching; Kaufman-type source; ion polishing; ion source; plasma neutralizer
• ISSN: 1027-4510; 1819-7094
• DOI: 10.1134/S1027451019020149

The results of testing a new miniature accelerated ion source (KLAN-10M) with a plasma neutralizer are reported. In particular, the operating modes of the source are studied, and the dependences of the ion-beam diameter and the ion current distribution along the output aperture surface on distance are measured. The ion current density with an output-aperture diameter of 7 mm (flat ion optics) is 10.4 mA/cm
2
, which allows one to precisely correct local errors in the surface shape of the optical components at a low beam divergence (≈15%). The operation of the plasma neutralizer is studied, the resulting electronic current of which provides, for this design, incomplete compensation of the space charge in a beam (the neutralizer current is 10 times less than the current of ions).