ZnO/Zn and ZnO film deposited via microwave atmospheric plasma jet as photo-catalyst for Rhodamine 6G dye degradation

• Published in: Thin solid films Vol. 624; pp. 197 - 200
• Main Authors: Tinacba, Erin Joy C., Nuñez, Julius Andrew, Tumlos, Roy B., Ramos, Henry J.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 28-02-2017
• Subjects: Microwave atmospheric plasma jet; Photocatalytic property; Plasma applications; Thin films; Zinc; Zinc oxide; Thin films; Plasma applications; Zinc oxide; Photocatalytic property; Zinc; Microwave atmospheric plasma jet
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2016.07.018

ZnO/Zn film was deposited on soda-lime glass substrate using a microwave atmospheric plasma jet. Energy dispersive spectroscopy showed that the Zn and O2 has an atomic ratio of 72:28. Zn (101) peak was also observed through X-ray Diffraction analysis. Annealing of the ZnO/Zn film at 400°C for 1h leads to the oxidation of Zn forming ZnO film. The photo-catalytic properties of the ZnO/Zn and ZnO films for the degradation of Rhodamine 6G dye were then compared. ZnO/Zn film has higher degradation rate of 1.37%/min while ZnO film has 1.23%/min.
•Microwave atmospheric plasma jet was used to deposit ZnO/Zn and ZnO films.•Both films can effectively photodegrade Rhodamine 6G dye solution.•ZnO/Zn film has faster degradation rate.