Determination of the parameters for the back-to-back switched Schottky barrier structures
The Cr/ n-GaAs/Cr and Ag/ p-GaAs/Ag metal–semiconductor–metal (MSM) Schottky contacts have been fabricated by reactive radio frequency (RF) sputtering system. The current–voltage ( I – V ) and capacitance–voltage ( C – V ) characteristics of the devices have been investigated in the temperature rang...
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Published in: | Current applied physics Vol. 10; no. 2; pp. 652 - 654 |
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Main Authors: | , |
Format: | Journal Article |
Language: | English |
Published: |
Elsevier B.V
01-03-2010
한국물리학회 |
Subjects: | |
Online Access: | Get full text |
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Summary: | The Cr/
n-GaAs/Cr and Ag/
p-GaAs/Ag metal–semiconductor–metal (MSM) Schottky contacts have been fabricated by reactive radio frequency (RF) sputtering system. The current–voltage
(
I
–
V
)
and capacitance–voltage
(
C
–
V
)
characteristics of the devices have been investigated in the temperature range of 80–316
K for the back-to-back switched Schottky barrier contacts. These measurements establish that the room temperature barrier height determined from reverse branch of the current–voltage characteristics is close to the value obtained from capacitance–voltage measurements. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 G704-001115.2010.10.2.016 |
ISSN: | 1567-1739 1878-1675 |
DOI: | 10.1016/j.cap.2009.08.012 |