Controllable vapor phase growth of vertically aligned ZnO nanorods on TCO/Glass substrates
Solution‐free and catalyst‐free vertically aligned ZnO nanorods have been synthesized by thermal CVD reactor at relatively low temperature (<500°C) to produce high‐surface 3D photoanode on glass substrate. Different TCOs films such as Al doped ZnO films deposited by PED, RF‐sputtering techniques...
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Published in: | Crystal research and technology (1979) Vol. 49; no. 8; pp. 558 - 563 |
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Main Authors: | , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Blackwell Publishing Ltd
01-08-2014
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Subjects: | |
Online Access: | Get full text |
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Summary: | Solution‐free and catalyst‐free vertically aligned ZnO nanorods have been synthesized by thermal CVD reactor at relatively low temperature (<500°C) to produce high‐surface 3D photoanode on glass substrate. Different TCOs films such as Al doped ZnO films deposited by PED, RF‐sputtering techniques and ITO were considered for the growth as starting seeding layer for the nanorods. The aim of the paper is mainly focused to control the thickness and length of these nanostructures by varying not only the growth parameters, such as amount of Zn evaporation, but also substrate characteristics, such as grain size of Al doped ZnO and ITO seeding films. The morphology of the different TCO substrates and also the grown ZnO nanorods have been analyzed with the help of atomic force microscopy and scanning electron microscopy. The study revealed that size and orientation of ZnO nanorods are mainly related to TCO's grain morphology and crystallinity, while their length can be controlled by varying Zn evaporation parameters.
Solution‐free and catalyst‐free vertically aligned ZnO nanorods have been synthesized by thermal CVD reactor at relatively low temperature (< 500 °C) to produce high‐surface 3D photoanode on glass substrate. The study revealed that size and orientation of ZnO nanorods are mainly related to TCO's grain morphology and crystallinity, while their length can be controlled by varying Zn evaporation parameters. |
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Bibliography: | istex:735DB3AE154BD863923F03AB20F8C4B9FE6F9835 ArticleID:CRAT201300422 European Union Seventh Framework Programme - No. n° 265073 ark:/67375/WNG-NBX0XK18-Z ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0232-1300 1521-4079 |
DOI: | 10.1002/crat.201300422 |