Grafted 2D Assembly of Colloidal Metal Nanoparticles for Application as a Variable Capacitor

A combination of sputtering and colloidal chemistry is employed to prepare [Co/Al2O3//Ru nanoparticles//Al2O3/Co] junctions (see figure). These junctions are applied as variable capacitors relying on Coulomb blockades in a 2D assembly of nanoparticles. AC measurements show a significant capacitance...

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Bibliographic Details
Published in:	Advanced materials (Weinheim) Vol. 19; no. 13; pp. 1729 - 1733
Main Authors:	Lidgi-Guigui, N., Dablemont, C., Veautier, D., Viau, G., Seneor, P., Nguyen Van Dau, F., Mangeney, C., Vaurès, A., Deranlot, C., Friederich, A.
Format:	Journal Article
Language:	English
Published:	Weinheim WILEY-VCH Verlag 02-07-2007 WILEY‐VCH Verlag
Subjects:	Capacitors Grafting Heterojunctions metal Nanoparticles Nanoparticles, metal
Online Access:	Get full text
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Summary:	A combination of sputtering and colloidal chemistry is employed to prepare [Co/Al2O3//Ru nanoparticles//Al2O3/Co] junctions (see figure). These junctions are applied as variable capacitors relying on Coulomb blockades in a 2D assembly of nanoparticles. AC measurements show a significant capacitance variation as a function of applied DC voltage with a maximum of relative variation value that is proportional to the particle density embedded in the dielectric layer and is in good agreement with the theoretical model.
Bibliography:	ark:/67375/WNG-MTHVXP2N-2 ArticleID:ADMA200602866 The authors are indebted to D. Schmauss and I. Vickridge (INSP, Paris) for access to the Van de Graaff accelerator of the Institut des Nanosciences and for their help with the RBS analysis. The authors acknowledge the French Ministry for Education and Research for financial support (ACI Nanoscience). istex:C0EF38607FBE5861F145861F82E7EF721D127ACD French Ministry for Education and Research ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23
ISSN:	0935-9648 1521-4095
DOI:	10.1002/adma.200602866