Production of silicon from magnesium silicide

Production of silicon from magnesium silicide

Kinetic methods and thermogravimetry were used to study the oxidation process of magnesium silicide in air in the temperature range 300–1000°C. The reaction products were identified by X-ray phase analysis. It was found that the reaction occurs in the temperature range 510–710°C to give silicon and...

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Bibliographic Details
Published in:Russian journal of applied chemistry Vol. 86; no. 4; pp. 493 - 497
Main Authors: Borshchev, V. M., D’yachenko, A. N., Kiselev, A. D., Kraidenko, R. I.
Format: Journal Article
Language:English
Published: Dordrecht SP MAIK Nauka/Interperiodica 01-04-2013
Subjects:
Chemistry
Chemistry and Materials Science
Chemistry/Food Science
Industrial Chemistry/Chemical Engineering
Inorganic Synthesis and Industrial Inorganic Chemistry
Elementary Silicon
Thermal Decomposition
Atmospheric Oxygen
Polycrystalline Silicon
Prescribe Temperature
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Summary:Kinetic methods and thermogravimetry were used to study the oxidation process of magnesium silicide in air in the temperature range 300–1000°C. The reaction products were identified by X-ray phase analysis. It was found that the reaction occurs in the temperature range 510–710°C to give silicon and magnesium oxide. With the temperature increasing further, silicon is oxidized to silicon dioxide.
ISSN:1070-4272
1608-3296
DOI:10.1134/S1070427213040060