Vacuum-deposited poly(o-methoxyaniline) thin films: Structure and electronic properties

Thin poly(o-methoxyaniline) (POMA) films have been formed by thermovacuum deposition in the temperature range of 350–450°C and at a pressure of 5×10−5Torr. The structure properties of vacuum deposited POMA films according to FTIR and UV–VIS spectra are similar to those observed for the emeraldine fo...

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Bibliographic Details
Published in:Journal of non-crystalline solids Vol. 354; no. 35-39; pp. 4282 - 4286
Main Authors: Cherpak, V., Stakhira, P., Hotra, Z., Aksimentyeva, O., Tsizh, B., Volynyuk, D., Bordun, I.
Format: Journal Article Conference Proceeding
Language:English
Published: Oxford Elsevier B.V 01-10-2008
Elsevier
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Summary:Thin poly(o-methoxyaniline) (POMA) films have been formed by thermovacuum deposition in the temperature range of 350–450°C and at a pressure of 5×10−5Torr. The structure properties of vacuum deposited POMA films according to FTIR and UV–VIS spectra are similar to those observed for the emeraldine form of polyaniline. Current–voltage characteristics (I–V) of sandwichtype device ITO/POMA/A1 possess rectifying properties with the ideality factor ≈4 at room temperature. On the basis of the dependence of conductivity on frequency in the frequency range of 10Hz to 1MHz, it is shown that the Pollack–Pohl current flow hopping mechanism dominates in a polymer film; such mechanism is typical of non-ordered systems.
ISSN:0022-3093
1873-4812
DOI:10.1016/j.jnoncrysol.2008.06.038