ULE® Glass for EUVL applications, a fictive temperature correlation

• Published in: Journal of non-crystalline solids Vol. 367; pp. 37 - 42
• Main Authors: Carapella, A.P., Duran, C.A., Hrdina, K.E., Sears, D.J., Tingley, J.E.
• Format: Journal Article
• Language: English
• Published: Oxford Elsevier B.V 01-05-2013; Elsevier
• Subjects: Applied sciences; EUVL; Exact sciences and technology; Fictive temperature; Hardening. Tempering; Heat treatment; Metals. Metallurgy; Production techniques; Silica; Titania; ULE® Glass; Fictive temperature; ULE® Glass; Titania; Silica; EUVL; Doping; Glass; Quenching; ULE
• ISSN: 0022-3093; 1873-4812
• DOI: 10.1016/j.jnoncrysol.2013.01.052

Infrared peak positions were correlated to the fictive temperatures (Tf) of titania doped silica glasses as a function of titania content for glasses with between 7 and 8wt.% TiO2. To establish fictive temperature, both the infrared peak position and the percent titania need to be known. The correlation was established by taking 1mm thick slices of silica doped with 7.0, 7.3 and 7.7wt.% TiO2, holding them isothermally until the structure comes into equilibrium with the hold temperature and then quenching the samples in room temperature water. Five hold temperatures between 900 and 1100°C were used. A correlation was obtained with R2 values of >0.98 for each TiO2 concentration.
► IR peak positions are correlated to fictive temperature of titania silicate glass. ► Titania content between 7 and 8wt.% is studied at fictive temperatures between 900 and 1100°C. ► A fictive temperature correlation is established for ULE® Glass with a low level of uncertainty.