Hardness evaluation, stoichiometry and grain size of titanium nitride films obtained with plasma nitriding on Ti-6Al-4V samples

Hardness evaluation, stoichiometry and grain size of titanium nitride films obtained with plasma nitriding on Ti-6Al-4V samples

Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride fi...

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Bibliographic Details
Published in:Matéria Vol. 15; no. 2; pp. 299 - 302
Main Authors: Vasconcellos, Marcos Antonio Zen, Lima, Saulo Cordeiro, Hinrichs, Ruth
Format: Journal Article
Language:English
Published: Rede Latino-Americana de Materiais 2010
Subjects:
CONSTRUCTION & BUILDING TECHNOLOGY
MATERIALS SCIENCE, MULTIDISCIPLINARY
METALLURGY & METALLURGICAL ENGINEERING
hardness
nitride
Glow discharge
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Summary:Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X-Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.
ISSN:1517-7076
1517-7076
DOI:10.1590/S1517-70762010000200030