Structural Anisotropy of Amorphous Silicon Films Modified by Femtosecond Laser Pulses
It is demonstrated that the surface-relief orientation in the form of one-dimensional gratings with a period of 1.20 ± 0.02 μm formed under processing of hydrogenated-silicon films by femtosecond laser pulses (1.25 μm) with an energy density of 0.15 J/cm 2 is determined by the direction of the polar...
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Published in: | Optics and spectroscopy Vol. 124; no. 6; pp. 801 - 807 |
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Main Authors: | , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Moscow
Pleiades Publishing
01-06-2018
Springer Nature B.V |
Subjects: | |
Online Access: | Get full text |
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Summary: | It is demonstrated that the surface-relief orientation in the form of one-dimensional gratings with a period of 1.20 ± 0.02 μm formed under processing of hydrogenated-silicon films by femtosecond laser pulses (1.25 μm) with an energy density of 0.15 J/cm
2
is determined by the direction of the polarization vector of the radiation and total laser exposure. Based on the results of the analysis of Raman spectra, the presence of a nanocrystalline phase of silicon with a volume fraction between 15 and 67% (depending on processing conditions) is detected. The observed processes of micro- and nanostructuring are caused by excitation of the surface plasmon–polaritons and nanocrystallization in the near-surface region in the field of high-power femtosecond laser pulses, respectively. In addition, formation of polymorph modifications of silicon Si-III and Si-XII under femtosecond laser processing with a number of pulses exceeding 500 is discovered. Anisotropy of the Raman signal for the above polymorph modifications is revealed. |
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ISSN: | 0030-400X 1562-6911 |
DOI: | 10.1134/S0030400X18060218 |