Precise angle and position detection utilizing optical interference on metal-oxide-semiconductor-type position-sensitive detectors
The optical interference effect is applied to the previously presented metal-oxide-semiconductor (MOS)-type position-sensitive detector (PSD) to achieve more precise measurements. New interference methods are proposed for the precise measurement of angles and positions, which have been examined by t...
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Published in: | Japanese Journal of Applied Physics Vol. 34; no. 2A; pp. 638 - 642 |
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Main Authors: | , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Tokyo
Japanese journal of applied physics
1995
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Subjects: | |
Online Access: | Get full text |
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Summary: | The optical interference effect is applied to the previously presented metal-oxide-semiconductor (MOS)-type position-sensitive detector (PSD) to achieve more precise measurements. New interference methods are proposed for the precise measurement of angles and positions, which have been examined by the use of Al-SiO
2
-Si PSD.
It has been experimentally verified that the PSD is convenient for optical interference to produce periodic output signals indicating half-wavelength displacement. A resolution of one second has been demonstrated for the simple angle-detection system in which only an optical-parallel glass plate is added to the PSD measurement system, and that of 20 nm for the position-detection system of a Michelson-type interferometer incorporated with the PSD. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.34.638 |