Preparation of ZrNxOy films by magnetron sputtering using air as a reactive gas

• Published in: Thin solid films Vol. 518; no. 24; pp. 7300 - 7303
• Main Authors: CHAN, Mu-Hsuan, WU, Po-Lun, LU, Fu-Hsing
• Format: Conference Proceeding Journal Article
• Language: English
• Published: Amsterdam Elsevier 01-10-2010
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Deposition by sputtering; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures; Exact sciences and technology; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation; Optical properties of specific thin films; Physics; Surface and interface electron states; Electronic properties; Photonic band gap; Pressure effects; Zirconium Oxynitrides; Optical band gap; Zirconium oxynitride; XRD; Air; Transmittance; Sputtering; High pressure; Thin films; Cathode sputtering; Energy gap; Zirconium oxide; Optical properties; Low pressure; Beryllium; Zirconium nitride; Physical vapor deposition; Sputter deposition; Atomic structure; X-ray photoelectron spectra; Crystal structure
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2010.04.097