ZrO2 thin films on Si substrate

• Published in: Journal of materials science. Materials in electronics Vol. 21; no. 10; pp. 980 - 993
• Main Authors: Wong, Yew Hoong, Cheong, Kuan Yew
• Format: Journal Article
• Language: English
• Published: Boston Springer US 01-10-2010; Springer; Springer Nature B.V
• Subjects: Applied sciences; Characterization and Evaluation of Materials; Chemistry and Materials Science; Corrosion; Corrosion mechanisms; Deposition; Design. Technologies. Operation analysis. Testing; Dielectrics; Electrical properties; Electronics; Exact sciences and technology; Integrated circuits; Materials; Materials Science; Metals. Metallurgy; Microelectronic fabrication (materials and surfaces technology); Optical and Electronic Materials; Oxides; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Silicon substrates; Thin films; Zirconium dioxide; Pulse Laser Deposition Technique; ZrCl4; Equivalent Oxide Thickness; Leakage Current Density; Atomic Layer Deposition; Ultrathin films; MOS technology; Semiconductor materials; Electrical properties; Microelectronics; IV-VI compound; Thin film; ULSI circuit; Zirconium; Zirconium oxide; Silicon oxides; Integrated circuit; Properties of materials; High k dielectric; Oxidation; Silicon; Miniaturization; Electrical characteristic
• ISSN: 0957-4522; 1573-482X
• DOI: 10.1007/s10854-010-0144-5

In the advancement of metal–oxide–semiconductor technology, Si-based semiconductor, with SiO
2
as outstanding dielectric, has been dominating microelectronic industry for decades. However, the drastic down-scaling in ultra-large-scale integrated circuitry has made ultrathin SiO
2
(~1.2 nm) unacceptable for many practical reasons. Introduction of ZrO
2
as high-
κ
dielectrics replacing SiO
2
is undeniably a potential yet formidable solution for the aforementioned problem. The objective of this review is to present the current knowledge of ZrO
2
thin film as gate dielectric on Si, in terms of its material and electrical properties produced by various deposition techniques. One of the techniques being focused is thermal oxidation of sputtered Zr and the mechanisms of transforming the metal into oxide has been extensively reviewed.