The microstructure and X-ray reflectivity of Mo/Si multilayers

We have studied microstructure Mo/Si multilayers grown by RF and DC sputtering at different deposition parameters by cross-sectional transmission electron microscopy and X-ray reflectivity for the wavelength 13.4 nm and 0.154 nm. It is shown experimentally that reflection properties of mirrors are d...

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Bibliographic Details
Published in:	Thin solid films Vol. 415; no. 1; pp. 123 - 132
Main Authors:	Andreev, S.S, Gaponov, S.V, Gusev, S.A, Haidl, M.N, Kluenkov, E.B, Prokhorov, K.A, Polushkin, N.I, Sadova, E.N, Salashchenko, N.N, Suslov, L.A, Zuev, S.Yu
Format:	Journal Article
Language:	English
Published:	Elsevier B.V 01-08-2002
Subjects:	Molybdenum Multilayers Sputter deposition Transmission electron microscopy Multilayers Transmission electron microscopy Sputter deposition Molybdenum
Online Access:	Get full text
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Summary:	We have studied microstructure Mo/Si multilayers grown by RF and DC sputtering at different deposition parameters by cross-sectional transmission electron microscopy and X-ray reflectivity for the wavelength 13.4 nm and 0.154 nm. It is shown experimentally that reflection properties of mirrors are determined by the crystalline state of molybdenum layers. The results are compared for the different samples and discussed in view of the choice an optimal deposition parameters to produce multilayers with a high X-ray reflectivity for the λ=13.4 nm.
Bibliography:	ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23
ISSN:	0040-6090 1879-2731
DOI:	10.1016/S0040-6090(02)00536-9