Chemical composition and bond structure of aerosol particles of amorphous hydrogenated silicon forming from thermal decomposition of silane
Aerosol particles of amorphous hydrogenated silicon resulting from thermal decomposition of silane were investigated by hydrogen evolution, IR-, EPR-, NMR spectroscopy, and transmission electron microscopy. The experimental data show that aerosol particles contain to a various extent {SiH 2} n polym...
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Published in: | Journal of aerosol science Vol. 28; no. 8; pp. 1425 - 1441 |
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Main Authors: | , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Oxford
Elsevier Ltd
01-12-1997
Elsevier Science |
Online Access: | Get full text |
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Summary: | Aerosol particles of amorphous hydrogenated silicon resulting from thermal decomposition of silane were investigated by hydrogen evolution, IR-, EPR-, NMR spectroscopy, and transmission electron microscopy.
The experimental data show that aerosol particles contain to a various extent {SiH
2}
n
polymer structures and two types of monohydride groups SiH- “clustered” and “dilute” monohydride groups. The hydrogen atoms of the “clustered” monohydride groups are located close to each other. The “clustered” monohydride groups are inaccessible to the ambient because they are embedded in the amorphous network. The “dilute” monohydride groups are relatively isolated from each other. The majority of “dilute” monohydride groups are open to the ambient. They are located on the surface of preferentially interconnected microchannels and microvoids.
Interaction between the “dilute” SiH groups and atmospheric oxygen results in formation of OSiH groups in which hydrogen and oxygen are bonded to a common silicon atom. Evidently, the interaction occurs throw the oxygen reaction with weak bonds associated with “dilute” monohydride groups. There is no interaction between oxygen and both “clustered” SiH groups and {SiH
2}
n
chain because the former are inaccessible to atmospheric oxygen and the latter has presumably no weak bonds in the chains. |
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ISSN: | 0021-8502 1879-1964 |
DOI: | 10.1016/S0021-8502(97)00026-8 |