Growth of carbon/nickel multilayer for X-ray–UV optics by RF reactive magnetron sputtering

• Published in: Applied surface science Vol. 148; no. 3; pp. 142 - 146
• Main Authors: Georgescu, G, Nelea, V, Ulmeanu, M, Ghica, C, Nastase, N
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 01-07-1999; Elsevier Science
• Subjects: Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Deposition by sputtering; Exact sciences and technology; Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties; Magnetron sputtering; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Multilayer; Physics; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); X–UV optics; EE; Magnetron sputtering; CF; Multilayer; NC; SOP; MU; XBD; X–UV optics; APN; Atomic force microscopy; X-ray reflection; Amorphous state; Experimental study; Carbon; Film growth; Magnetrons; Multilayers; Cathode sputtering; Transition elements; Superlattices; Nickel; Reactive sputtering; Microstructure; TEM
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/S0169-4332(99)00219-6

Amorphous C/Ni superlattice films designed as normal-incidence reflector for 5 nm have been grown on float-glass substrates by magnetron sputter deposition in Ar discharge. A comprehensive set of characterization techniques has been applied: grazing X-ray reflection (0.154 nm), atomic force microscopy and transmission electron microscopy in order to determine the quality of the structure. By comparing the results, it could be concluded that RF-magnetron sputtering technique is a good choice for growing such layered synthetic microstructures.