Third-order optical nonlinearity in molybdenum trioxide (MoO3)-doped vanadium pentaoxide (V2O5) thin films

• Published in: The European physical journal. D, Atomic, molecular, and optical physics Vol. 75; no. 9
• Main Authors: Poonam, Mohan, Devendra, Purnima, Kumar, Anil, Barala, Monika, Yadav, Kavita
• Format: Journal Article
• Language: English
• Published: Berlin/Heidelberg Springer Berlin Heidelberg 01-09-2021; Springer Nature B.V
• Subjects: Absorptivity; Applications of Nonlinear Dynamics and Chaos Theory; Atomic; Constraining; Glass substrates; Laser beams; Lasers; Lattice parameters; Molecular; Molybdenum; Molybdenum trioxide; Neodymium lasers; Nonlinearity; Optical and Plasma Physics; Physical Chemistry; Physics; Physics and Astronomy; Pulsed lasers; Quantum Information Technology; Quantum Physics; Refractivity; Regular Article – Optical Phenomena and Photonics; Spectroscopy/Spectrometry; Spintronics; Thickness; Thin films; Vanadium pentoxide; YAG lasers
• ISSN: 1434-6060; 1434-6079
• DOI: 10.1140/epjd/s10053-021-00242-0

The present work focuses on investigation of laser-induced third-order optical nonlinearity in molybdenum trioxide (
MoO
3
)-doped vanadium pentaoxide (
V
2
O
5
) thin films.
MoO
3
has been doped in
V
2
O
5
at different concentrations and thin films (
MoO
3
:
V
2
O
5
) with varying thickness have been deposited on glass substrate by standard thermal evaporation method. X-ray diffraction studies show that deposited films have orthorhombic structure and the lattice parameters change with amount of doping as well as with the thickness of the film. A Nd:YAG-pulsed laser beam having wavelength
∼
532nm has been used as excitation source. Intensity-dependent absorption coefficient (
β
), nonlinear refractive index (
n
2
) and cubic nonlinear susceptibility (
χ
3
) have been estimated using single-beam Z-scan technique. A concentration-dependent switching of optical nonlinearity has been observed occurring due to internal self-action effects. Optical limiting behavior has also been reported with limiting threshold (
T
L
). Existence of strong third-order optical nonlinear susceptibility
(
χ
3
) with quite low limiting threshold (
T
L
) for visible laser beam confirms that
MoO
3
:
V
2
O
5
thin films have a great potential for the applications in photonic devices.