Influence of Plasma Treatment on Dyeing Properties of Silk Weaves

• Published in: Journal of natural fibers Vol. 19; no. 13; pp. 7087 - 7099
• Main Authors: Palaskar, Shital S., Kale, Ravindra D., Deshmukh, Rajendra R.
• Format: Journal Article
• Language: English
• Published: Abingdon Taylor & Francis 01-12-2022; Taylor & Francis Ltd; Taylor & Francis Group
• Subjects: Atomic force microscopy; Different grams per meter square GSM; Dyeing; Dyes; Fabrics; Helium; Low temperature; mulberry silk; Photoelectrons; plasma; Silk; surface modification; Surface roughness; weave structure; 不同克/平方米（GSM）; 桑蚕丝; 组织结构; 表面改性
• ISSN: 1544-0478; 1544-046X
• DOI: 10.1080/15440478.2021.1944424

Three different mulberry silk fabrics were modified with low temperature plasma using helium and oxygen gases. Dyeing properties of plasma treated fabrics were investigated. The dye adsorption capacity of plasma treated silk samples was improved by 6-17% as compared to untreated samples in all the three varieties of silk. Surface roughness was quantitatively measured using Atomic Force Microscope (AFM). X-ray photoelectron spectroscopic study showed the formation of polar groups on plasma treated silk samples. Finally, it is concluded that the degree of plasma surface modification and dyeing properties of silk fabric are closely linked to weave and GSM of fabric.