Electron beam-induced current investigation of GaN schottky diode
In this article, we report the electron beam-induced current (EBIC) measurements in a GaN Schottky diode performed in the line-scan configuration. A theoretical model with an extended generation source was used to accurately extract some minority carrier transport properties of the unintentionally d...
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Published in: | Journal of electronic materials Vol. 34; no. 7; pp. 1059 - 1064 |
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Main Authors: | , , , , , |
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Abstract | In this article, we report the electron beam-induced current (EBIC) measurements in a GaN Schottky diode performed in the line-scan configuration. A theoretical model with an extended generation source was used to accurately extract some minority carrier transport properties of the unintentionally doped n-GaN layer. The minority hole diffusion length is found to increase from ~0.35 µm near the junction to ~1.74 µm at the bulk regions. This change is attributed to an increase of the carrier lifetime caused by the polarization effects, which are preponderant in this component. For depth distances exceeding 0.65 µm, it is shown that the measured current is produced by the reabsorption recombination radiation process. This corresponds to an absorption coefficient of 0.178 µm^sup -1^, in good agreement with the optical absorption measurement. [PUBLICATION ABSTRACT] |
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AbstractList | In this article, we report the electron beam-induced current (EBIC) measurements in a GaN Schottky diode performed in the line-scan configuration. A theoretical model with an extended generation source was used to accurately extract some minority carrier transport properties of the unintentionally doped n-GaN layer. The minority hole diffusion length is found to increase from ~0.35 mum near the junction to ~1.74 mum at the bulk regions. This change is attributed to an increase of the carrier lifetime caused by the polarization effects, which are preponderant in this component. For depth distances exceeding 0.65 mum, it is shown that the measured current is produced by the reabsorption recombination radiation process. This corresponds to an absorption coefficient of 0.178mum-1, in good agreement with the optical absorption measurement. In this article, we report the electron beam-induced current (EBIC) measurements in a GaN Schottky diode performed in the line-scan configuration. A theoretical model with an extended generation source was used to accurately extract some minority carrier transport properties of the unintentionally doped n-GaN layer. The minority hole diffusion length is found to increase from ~0.35 µm near the junction to ~1.74 µm at the bulk regions. This change is attributed to an increase of the carrier lifetime caused by the polarization effects, which are preponderant in this component. For depth distances exceeding 0.65 µm, it is shown that the measured current is produced by the reabsorption recombination radiation process. This corresponds to an absorption coefficient of 0.178 µm^sup -1^, in good agreement with the optical absorption measurement. [PUBLICATION ABSTRACT] |
Author | MATOUSSI, A GUERMAZI, S MLIK, Y EL JANI, B BOUFADEN, T TOUREILLE, A |
Author_xml | – sequence: 1 givenname: A surname: MATOUSSI fullname: MATOUSSI, A organization: Laboratoire LaMaCoP de Sfax, Institut Préparatoire aux études d'Ingénieurs de Sfax, 3000 Sfax, Tunisia – sequence: 2 givenname: T surname: BOUFADEN fullname: BOUFADEN, T organization: Laboratoire de Physique de Matériaux, Faculté des Sciences de Monastir, Monastir, Tunisia – sequence: 3 givenname: S surname: GUERMAZI fullname: GUERMAZI, S organization: Laboratoire LaMaCoP de Sfax, Institut Préparatoire aux études d'Ingénieurs de Sfax, 3000 Sfax, Tunisia – sequence: 4 givenname: Y surname: MLIK fullname: MLIK, Y organization: Laboratoire LaMaCoP de Sfax, Institut Préparatoire aux études d'Ingénieurs de Sfax, 3000 Sfax, Tunisia – sequence: 5 givenname: B surname: EL JANI fullname: EL JANI, B organization: Laboratoire de Physique de Matériaux, Faculté des Sciences de Monastir, Monastir, Tunisia – sequence: 6 givenname: A surname: TOUREILLE fullname: TOUREILLE, A organization: Laboratoire d'Electrotechnique, Université Montpellier II, 34000 Montpellier, France |
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Keywords | generation Polarization Minority carrier Transport properties recombination Doping Charge carrier mobility Hole mobility Absorption coefficient trapping Layer Gallium nitride Transport process GaN Carrier lifetime charge carriers EBIC electron beam-induced current (EBIC) Optical absorption Diffusion length Schottky barrier |
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References | O. Roos Von (96_CR27) 1983; 54 A. Matoussi (96_CR9) 2001; 32 S. Guermazi (96_CR12) 2001; 16 H. Gotoh (96_CR19) 2003; 83 Z.Z. Bandic (96_CR6) 1998; 483 L. Chernyak (96_CR16) 1996; 69 96_CR24 S.J. Pearton (96_CR4) 1999; 86 96_CR21 K. Kanaya (96_CR13) 1972; 5 A.T. Ping (96_CR5) 1998; 19 C. Monier (96_CR18) 1999; 85 L. Pavesi (96_CR26) 1994; 75 S. Guermazi (96_CR10) 1996; 6 L. Chernyak (96_CR17) 2002; 80 F.D. Sala (96_CR20) 1999; 74 T. Boufaden (96_CR22) 2004; 201 96_CR2 S.J. Rosner (96_CR15) 1996; 70 S. Nakamura (96_CR1) 1994; 64 A. Toureille (96_CR23) 1994; 32 96_CR7 N. Mohammad (96_CR3) 1996; 20 B. Akamatsu (96_CR14) 1981; 52 P. Hacke (96_CR8) 1996; 68 S. Guermazi (96_CR11) 2000; 9 J.J. Harris (96_CR25) 2000; 15 |
References_xml | – volume: 70 start-page: 794 year: 1996 ident: 96_CR15 publication-title: Appl. Phys. Lett. contributor: fullname: S.J. Rosner – volume: 68 start-page: 1362 year: 1996 ident: 96_CR8 publication-title: Appl. Phys. Lett. doi: 10.1063/1.116080 contributor: fullname: P. Hacke – volume: 32 start-page: 995 year: 2001 ident: 96_CR9 publication-title: Microelectron. J. doi: 10.1016/S0026-2692(01)00061-1 contributor: fullname: A. Matoussi – volume: 52 start-page: 7245 year: 1981 ident: 96_CR14 publication-title: J. Appl. Phys. doi: 10.1063/1.328710 contributor: fullname: B. Akamatsu – ident: 96_CR2 – volume: 80 start-page: 926 year: 2002 ident: 96_CR17 publication-title: Appl. Phys. Lett. doi: 10.1063/1.1448382 contributor: fullname: L. Chernyak – ident: 96_CR21 doi: 10.1002/pssc.200303137 – volume: 9 start-page: 43 year: 2000 ident: 96_CR11 publication-title: Eur. Phys. J. Appl. doi: 10.1051/epjap:2000198 contributor: fullname: S. Guermazi – volume: 64 start-page: 1687 year: 1994 ident: 96_CR1 publication-title: Appl. Phys. Lett. doi: 10.1063/1.111832 contributor: fullname: S. Nakamura – volume: 201 start-page: 582 year: 2004 ident: 96_CR22 publication-title: Phys. Status Solidi (a) doi: 10.1002/pssa.200306740 contributor: fullname: T. Boufaden – volume: 5 start-page: 43 year: 1972 ident: 96_CR13 publication-title: J. Phys. D: Appl. Phys. doi: 10.1088/0022-3727/5/1/308 contributor: fullname: K. Kanaya – volume: 83 start-page: 4791 year: 2003 ident: 96_CR19 publication-title: Appl. Phys. Lett. doi: 10.1063/1.1632539 contributor: fullname: H. Gotoh – volume: 54 start-page: 1390 year: 1983 ident: 96_CR27 publication-title: J. Appl. Phys. doi: 10.1063/1.332163 contributor: fullname: O. Roos Von – volume: 15 start-page: 413 year: 2000 ident: 96_CR25 publication-title: Semicond. Sci. Technol. doi: 10.1088/0268-1242/15/4/319 contributor: fullname: J.J. Harris – volume: 74 start-page: 2002 year: 1999 ident: 96_CR20 publication-title: Appl. Phys. Lett. doi: 10.1063/1.123727 contributor: fullname: F.D. Sala – volume: 19 start-page: 54 year: 1998 ident: 96_CR5 publication-title: IEEE Electron. Dev. Lett. doi: 10.1109/55.658603 contributor: fullname: A.T. Ping – volume: 69 start-page: 2531 year: 1996 ident: 96_CR16 publication-title: Appl. Phys. Lett. doi: 10.1063/1.117729 contributor: fullname: L. Chernyak – volume: 86 start-page: 1 year: 1999 ident: 96_CR4 publication-title: J. Appl. Phys. doi: 10.1063/1.371145 contributor: fullname: S.J. Pearton – volume: 483 start-page: 399 year: 1998 ident: 96_CR6 publication-title: Mater. Res. Soc. Symp. Proc. doi: 10.1557/PROC-483-399 contributor: fullname: Z.Z. Bandic – ident: 96_CR24 doi: 10.1103/PhysRevB.56.R10024 – volume: 20 start-page: 361 year: 1996 ident: 96_CR3 publication-title: Progr. Quantum Electron. doi: 10.1016/S0079-6727(96)00002-X contributor: fullname: N. Mohammad – volume: 16 start-page: 45 year: 2001 ident: 96_CR12 publication-title: Eur. Phys. J. Appl. doi: 10.1051/epjap:2001192 contributor: fullname: S. Guermazi – ident: 96_CR7 – volume: 32 start-page: 277 year: 1994 ident: 96_CR23 publication-title: J. Electrostat. doi: 10.1016/0304-3886(94)90016-7 contributor: fullname: A. Toureille – volume: 85 start-page: 2713 year: 1999 ident: 96_CR18 publication-title: J. Appl. Phys. doi: 10.1063/1.369606 contributor: fullname: C. Monier – volume: 75 start-page: 4794 year: 1994 ident: 96_CR26 publication-title: J. Appl. Phys. contributor: fullname: L. Pavesi – volume: 6 start-page: 481 year: 1996 ident: 96_CR10 publication-title: J. Phys. III France doi: 10.1051/jp3:1996136 contributor: fullname: S. Guermazi |
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Snippet | In this article, we report the electron beam-induced current (EBIC) measurements in a GaN Schottky diode performed in the line-scan configuration. A... |
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SubjectTerms | Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Diodes Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronics Exact sciences and technology Materials Microelectronics Physics Scanning electron microscopy Semiconductor doping Surface double layers, schottky barriers, and work functions |
Title | Electron beam-induced current investigation of GaN schottky diode |
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