Electron beam-induced current investigation of GaN schottky diode

In this article, we report the electron beam-induced current (EBIC) measurements in a GaN Schottky diode performed in the line-scan configuration. A theoretical model with an extended generation source was used to accurately extract some minority carrier transport properties of the unintentionally d...

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Published in:Journal of electronic materials Vol. 34; no. 7; pp. 1059 - 1064
Main Authors: MATOUSSI, A, BOUFADEN, T, GUERMAZI, S, MLIK, Y, EL JANI, B, TOUREILLE, A
Format: Journal Article
Language:English
Published: New York, NY Institute of Electrical and Electronics Engineers 01-07-2005
Springer Nature B.V
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Abstract In this article, we report the electron beam-induced current (EBIC) measurements in a GaN Schottky diode performed in the line-scan configuration. A theoretical model with an extended generation source was used to accurately extract some minority carrier transport properties of the unintentionally doped n-GaN layer. The minority hole diffusion length is found to increase from ~0.35 µm near the junction to ~1.74 µm at the bulk regions. This change is attributed to an increase of the carrier lifetime caused by the polarization effects, which are preponderant in this component. For depth distances exceeding 0.65 µm, it is shown that the measured current is produced by the reabsorption recombination radiation process. This corresponds to an absorption coefficient of 0.178 µm^sup -1^, in good agreement with the optical absorption measurement. [PUBLICATION ABSTRACT]
AbstractList In this article, we report the electron beam-induced current (EBIC) measurements in a GaN Schottky diode performed in the line-scan configuration. A theoretical model with an extended generation source was used to accurately extract some minority carrier transport properties of the unintentionally doped n-GaN layer. The minority hole diffusion length is found to increase from ~0.35 mum near the junction to ~1.74 mum at the bulk regions. This change is attributed to an increase of the carrier lifetime caused by the polarization effects, which are preponderant in this component. For depth distances exceeding 0.65 mum, it is shown that the measured current is produced by the reabsorption recombination radiation process. This corresponds to an absorption coefficient of 0.178mum-1, in good agreement with the optical absorption measurement.
In this article, we report the electron beam-induced current (EBIC) measurements in a GaN Schottky diode performed in the line-scan configuration. A theoretical model with an extended generation source was used to accurately extract some minority carrier transport properties of the unintentionally doped n-GaN layer. The minority hole diffusion length is found to increase from ~0.35 µm near the junction to ~1.74 µm at the bulk regions. This change is attributed to an increase of the carrier lifetime caused by the polarization effects, which are preponderant in this component. For depth distances exceeding 0.65 µm, it is shown that the measured current is produced by the reabsorption recombination radiation process. This corresponds to an absorption coefficient of 0.178 µm^sup -1^, in good agreement with the optical absorption measurement. [PUBLICATION ABSTRACT]
Author MATOUSSI, A
GUERMAZI, S
MLIK, Y
EL JANI, B
BOUFADEN, T
TOUREILLE, A
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  fullname: TOUREILLE, A
  organization: Laboratoire d'Electrotechnique, Université Montpellier II, 34000 Montpellier, France
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Cites_doi 10.1063/1.116080
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Issue 7
Keywords generation
Polarization
Minority carrier
Transport properties
recombination
Doping
Charge carrier mobility
Hole mobility
Absorption coefficient
trapping
Layer
Gallium nitride
Transport process
GaN
Carrier lifetime
charge carriers
EBIC
electron beam-induced current (EBIC)
Optical absorption
Diffusion length
Schottky barrier
Language English
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  start-page: 481
  year: 1996
  ident: 96_CR10
  publication-title: J. Phys. III France
  doi: 10.1051/jp3:1996136
  contributor:
    fullname: S. Guermazi
SSID ssj0015181
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Snippet In this article, we report the electron beam-induced current (EBIC) measurements in a GaN Schottky diode performed in the line-scan configuration. A...
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SubjectTerms Applied sciences
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Diodes
Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures
Electronics
Exact sciences and technology
Materials
Microelectronics
Physics
Scanning electron microscopy
Semiconductor doping
Surface double layers, schottky barriers, and work functions
Title Electron beam-induced current investigation of GaN schottky diode
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https://search.proquest.com/docview/29383037
Volume 34
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