Electron beam-induced current investigation of GaN schottky diode

In this article, we report the electron beam-induced current (EBIC) measurements in a GaN Schottky diode performed in the line-scan configuration. A theoretical model with an extended generation source was used to accurately extract some minority carrier transport properties of the unintentionally d...

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Bibliographic Details
Published in:Journal of electronic materials Vol. 34; no. 7; pp. 1059 - 1064
Main Authors: MATOUSSI, A, BOUFADEN, T, GUERMAZI, S, MLIK, Y, EL JANI, B, TOUREILLE, A
Format: Journal Article
Language:English
Published: New York, NY Institute of Electrical and Electronics Engineers 01-07-2005
Springer Nature B.V
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Summary:In this article, we report the electron beam-induced current (EBIC) measurements in a GaN Schottky diode performed in the line-scan configuration. A theoretical model with an extended generation source was used to accurately extract some minority carrier transport properties of the unintentionally doped n-GaN layer. The minority hole diffusion length is found to increase from ~0.35 µm near the junction to ~1.74 µm at the bulk regions. This change is attributed to an increase of the carrier lifetime caused by the polarization effects, which are preponderant in this component. For depth distances exceeding 0.65 µm, it is shown that the measured current is produced by the reabsorption recombination radiation process. This corresponds to an absorption coefficient of 0.178 µm^sup -1^, in good agreement with the optical absorption measurement. [PUBLICATION ABSTRACT]
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content type line 23
ISSN:0361-5235
1543-186X
DOI:10.1007/s11664-005-0096-3