Electronic properties of the iron phthalocyanine thin films UHV annealed and exposed to oxygen

• Published in: Vacuum Vol. 46; no. 5; pp. 547 - 549
• Main Authors: Szuber, J, Szczepaniak, B, Kochowski, S, Opilski, A
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Oxford Elsevier Ltd 01-05-1995; Elsevier
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Electron states and collective excitations in multilayers, quantum wells, mesoscopic, and nanoscale systems; Electron states and collective excitations in thin films, multilayers, quantum wells, mesoscopic and nanoscale systems; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures; Exact sciences and technology; Physics; Thin films; Annealing; Electronic structure; Iron complexes; Metallophthalocyanine; Energy-level density; Experimental study; Oxygenation
• ISSN: 0042-207X; 1879-2715
• DOI: 10.1016/0042-207X(94)00127-8

The electronic properties of the UHV annealed iron phthalocyanine (FePc) thin films exposed to oxygen have been studied using Photoemission Yield Spectroscopy (PYS). Depending on the annealing temperature as well as the oxygen exposure, the variations of the work function ϑ were analyzed together with the effective density of the filled electronic states localized in the band gap below the Fermi level
E
F
and in the upper part of the valence band. The possible origin of these electronic states was briefly discussed.