Influence of the annealing conditions on the properties of InP thin films

• Published in: Materials science & engineering. B, Solid-state materials for advanced technology Vol. 131; no. 1; pp. 94 - 99
• Main Authors: Öztaş, M., Bedir, M., Kayalı, R., Aksoy, F.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 15-07-2006
• Subjects: Annealing; InP; Spray pyrolysis; Structural properties; Thin film; Annealing; InP; Spray pyrolysis; Structural properties; Thin film
• ISSN: 0921-5107; 1873-4944
• DOI: 10.1016/j.mseb.2006.03.033

InP thin films were prepared on glass substrates by the spray pyrolysis technique. Results on structural, optical and electrical properties of the layers as a function of the thermal annealing are reported. XRD data indicates that samples show microstructural perfection improvement as a function of annealing time. The optical band-gap shows a dependence with the inverse of the squared crystallite size, suggesting that electron confinement has some effect. The lattice parameter and band-gap energy (BGE) of the samples annealed at 450
°C for 160
min (20–40–80–120–160–200) correspond to the reported values of InP thin films. In addition, the electrical resistivity measurement shows a slight decrease when annealing time is increased up to 80
min but it saturates annealing times between 80 and 160
min. Then it is slightly increased for larger times.