Turn-Around of Threshold Voltage in Gate Bias Stressed p-Channel Power Vertical Double-Diffused Metal–Oxide–Semiconductor Transistors
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Published in: | Japanese Journal of Applied Physics Vol. 47; no. 8R; p. 6272 |
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Main Authors: | , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
01-08-2008
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Online Access: | Get full text |
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ISSN: | 0021-4922 1347-4065 |
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DOI: | 10.1143/JJAP.47.6272 |