Photoemission spectromicroscopy studies on epitaxial lateral overgrowth GaN surfaces

Photoemission spectromicroscopy is employed to investigate the inhomogeneities of surface electronic structures of epitaxial lateral overgrowth GaN material. The image, acquired on a clean surface, shows the surface morphology and agrees with the atomic force microscopy image. The dominant contrast...

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Bibliographic Details
Published in:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Vol. 17; no. 4; pp. 1884 - 1890
Main Authors: Yang, Y., Mishra, S., Cerrina, F., Xu, S. H., Cruguel, H., Lapeyre, G. J., Schetzina, J. F.
Format: Conference Proceeding
Language:English
Published: United States 01-07-1999
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Summary:Photoemission spectromicroscopy is employed to investigate the inhomogeneities of surface electronic structures of epitaxial lateral overgrowth GaN material. The image, acquired on a clean surface, shows the surface morphology and agrees with the atomic force microscopy image. The dominant contrast mechanism is attributed to the angular dependence of the quantum yield for regions at different angles. Energy distribution curves localized to a submicron region for the Ga 3d core level demonstrate that growth-front areas have different Fermi level pinning behavior compared with window areas and overgrowth regions. The sample exposed to atomic hydrogen shows the same Fermi level position for all areas of the surface. Photoemission spectromicroscopy reveals island formation when about 10 monolayers of Mg is deposited on the surface.
Bibliography:None
CONF-990138--
ISSN:0734-211X
1520-8567
2327-9877
DOI:10.1116/1.590840