Photoemission spectromicroscopy studies on epitaxial lateral overgrowth GaN surfaces
Photoemission spectromicroscopy is employed to investigate the inhomogeneities of surface electronic structures of epitaxial lateral overgrowth GaN material. The image, acquired on a clean surface, shows the surface morphology and agrees with the atomic force microscopy image. The dominant contrast...
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Published in: | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Vol. 17; no. 4; pp. 1884 - 1890 |
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Main Authors: | , , , , , , |
Format: | Conference Proceeding |
Language: | English |
Published: |
United States
01-07-1999
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Subjects: | |
Online Access: | Get full text |
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Summary: | Photoemission spectromicroscopy is employed to investigate the inhomogeneities of surface electronic structures of epitaxial lateral overgrowth GaN material. The image, acquired on a clean surface, shows the surface morphology and agrees with the atomic force microscopy image. The dominant contrast mechanism is attributed to the angular dependence of the quantum yield for regions at different angles. Energy distribution curves localized to a submicron region for the Ga 3d core level demonstrate that growth-front areas have different Fermi level pinning behavior compared with window areas and overgrowth regions. The sample exposed to atomic hydrogen shows the same Fermi level position for all areas of the surface. Photoemission spectromicroscopy reveals island formation when about 10 monolayers of Mg is deposited on the surface. |
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Bibliography: | None CONF-990138-- |
ISSN: | 0734-211X 1520-8567 2327-9877 |
DOI: | 10.1116/1.590840 |