Plasma-assisted chemical vapour deposition of tin oxide coatings

Authors assess the potential of plasma-assisted CVD as a method for coating C fiber bundles. Dc and hollow-cathode discharges generated in an SnCl sub 4 -O sub 2 medium help deposit the SnO sub 2 coatings on fibers heated to approximately 800 degrees C and kept in the plasma for 15 min.

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Bibliographic Details
Published in:	Journal of materials science Vol. 28; no. 5; pp. 1155 - 1160
Main Authors:	INAL, O. T, BENGISU, M, GUARDIAN, J
Format:	Journal Article
Language:	English
Published:	Heidelberg Springer 01-03-1993
Subjects:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science; rheology Exact sciences and technology Materials science Methods of deposition of films and coatings; film growth and epitaxy Physics Crystal growth Plasma Tin IV Oxides Potential Experimental study Coatings Chemical vapor deposition Inorganic compound Thin film Carbon fiber
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Description
Summary:	Authors assess the potential of plasma-assisted CVD as a method for coating C fiber bundles. Dc and hollow-cathode discharges generated in an SnCl sub 4 -O sub 2 medium help deposit the SnO sub 2 coatings on fibers heated to approximately 800 degrees C and kept in the plasma for 15 min.
Bibliography:	ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23
ISSN:	0022-2461 1573-4803
DOI:	10.1007/BF01191946