Double-Halo Field-Effect Transistor-A Multifunction Device to Sustain the Speed and Density Rate of Modern Integrated Circuits

In this paper, an extensive description of the main characteristics and possible applications of a double-halo metal-oxide-semiconductor (MOS) device is presented. In particular, the details concerning the prototype fabrication through a standard complementary MOS (CMOS) process and the obtained exp...

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Bibliographic Details
Published in:IEEE transactions on electron devices Vol. 58; no. 12; pp. 4226 - 4234
Main Authors: Marino, F. A., Meneghesso, G.
Format: Journal Article
Language:English
Published: New York, NY IEEE 01-12-2011
Institute of Electrical and Electronics Engineers
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:In this paper, an extensive description of the main characteristics and possible applications of a double-halo metal-oxide-semiconductor (MOS) device is presented. In particular, the details concerning the prototype fabrication through a standard complementary MOS (CMOS) process and the obtained experimental results are reported. Extensive numerical device simulation has been carried out in order to deeply understand the new structure. Furthermore, to gain insight on the device behavior, an electrical model to be used in SPICE-like circuit simulation tools has been developed and verified. As shown by our analysis, digital integrated circuits employing the new technology introduce, with respect to standard CMOS ones, a drastic reduction of both the device number and the parasitic capacitances, leading to a significant improvement of the circuit performance.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2011.2169067