Highly Performing MSM Type Ag/n-titanium Dioxide Nanotubes/p-Si Heterojunction Based Ultraviolet-A Photodetectors
Recently, heterojunction-based ultraviolet (UV) photodetectors (PDs) have found a wide range of applications in day-to-day life. The fabrication of these UV PD devices using high- k TiO 2 nanostructures i.e. nanotubes (NTs) at low temperature processing steps in association with cost-effective depos...
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Published in: | SILICON Vol. 16; no. 7; pp. 2815 - 2826 |
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Main Authors: | , , , , , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Dordrecht
Springer Netherlands
2024
Springer Nature B.V |
Subjects: | |
Online Access: | Get full text |
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Summary: | Recently, heterojunction-based ultraviolet (UV) photodetectors (PDs) have found a wide range of applications in day-to-day life. The fabrication of these UV PD devices using high-
k
TiO
2
nanostructures i.e. nanotubes (NTs) at low temperature processing steps in association with cost-effective deposition methods is crucial. In this work, Ag/n-TiO
2
NTs/p-Si heterojunction-based MSM UV PD devices were fabricated using hydrothermal, spin coating and e-beam evaporation methods. The structural, chemical, optical, morphological and elemental composition characteristics of the formed TiO
2
NTs/p-Si stacks were explored by XRD/Raman, XPS, UV–Vis, FESEM and EDS techniques, respectively. XRD and FESEM analysis revealed the formation of anatase phase of TiO
2
NTs with an average diameter of ~ 16.1 nm and length of ~ 50.9 nm. XPS investigation revealed two intense core level BE peaks of Ti2p
3/2
and Ti2p
1/2
. The photodetection parameters of the fabricated MSM UV PD device were systematically checked in dark and UV-A light (320–400 nm) illumination. At 3 V, the fabricated Ag/n-TiO
2
NTs/p-Si device presented superior photosensing properties with a responsivity of 570 mA/W, EQE of 189% and rise/decay times of 120 ms/95 ms. Further, the superior structural and photosensing parameters attained from the fabricated MSM UV PD device may expand its scope to serve as a future cost-effective alternative to other wide bandgap semiconductor (GaN, SiC and ZnO) based heterojunction PD devices. |
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ISSN: | 1876-990X 1876-9918 |
DOI: | 10.1007/s12633-024-02877-1 |