Properties and applications of electron cyclotron plasma deposited SiOxNy films with graded refractive index profiles

Properties and applications of electron cyclotron plasma deposited SiOxNy films with graded refractive index profiles

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Bibliographic Details
Published in:Journal of non-crystalline solids Vol. 187; pp. 484 - 488
Main Authors: BULKIN, P. V, SWART, P. L, LACQUET, B. M
Format: Conference Proceeding Journal Article
Language:English
Published: Amsterdam Elsevier 01-07-1995
Subjects:
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Engineering Sciences
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Gradient-index (grin) devices
Optical elements, devices, and systems
Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation
Optical properties of specific thin films
Optics
Other semiconductors
Physics
CVD
Thin films
Oxynitrides
Silicon compounds
Plasma
Inorganic compounds
Quantity ratio
Electron cyclotron-resonance
Refractive index
Grin devices
Experimental study
Extinction index
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Description
ISSN:0022-3093
1873-4812
DOI:10.1016/0022-3093(95)00181-6