Diamond film growth on Ti-implanted glassy carbon

• Published in: Applied physics letters Vol. 63; no. 12; pp. 1631 - 1633
• Main Authors: BREWER, M. A, BROWN, I. G, EVANS, P. J, HOFFMAN, A
• Format: Journal Article
• Language: English
• Published: Melville, NY American Institute of Physics 20-09-1993
• Subjects: 360601 - Other Materials- Preparation & Manufacture; ABRASION; CARBON; CHARGED PARTICLES; Cross-disciplinary physics: materials science; rheology; CRYSTAL GROWTH METHODS; DEPOSITION; DIAMONDS; ELEMENTAL MINERALS; ELEMENTS; Exact sciences and technology; ION IMPLANTATION; IONS; MATERIALS SCIENCE; Methods of deposition of films and coatings; film growth and epitaxy; MINERALS; NONMETALS; NUCLEATION; Physics; SURFACE TREATMENTS; TITANIUM IONS; Crystal growth; Abrasion; Raman spectra; Ion implantation; Diamonds; Surface treatments; Experimental study; Titanium additions; Substrates; Thin films; Nonmetals; Crystal nucleation; SEM; Pretreatment; Nucleation density
• ISSN: 0003-6951; 1077-3118
• DOI: 10.1063/1.110718

The growth of diamond thin films on glassy carbon substrates has been investigated as a function of deposition time for different surface treatments. Implantation of Ti to a dose of 1.7×1017 cm−2 and abrasion with diamond powder have both been examined to determine their effect on film nucleation and growth. At the shorter deposition times studied, diamond nucleation was observed on all test samples with those subjected to the abrasive pretreatment exhibiting the higher growth rates. However, the adhesion and uniformity of films on unimplanted glassy carbon were found to deteriorate significantly following deposition runs of 14 and 21 h duration. This was attributed to a destabilization of the underlying surface caused by plasma erosion.