Design of a tri-layer bottom anti-reflective coating for KrF, ArF and F2 lithographies

Design of a tri-layer bottom anti-reflective coating for KrF, ArF and F2 lithographies

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Bibliographic Details
Published in:Microelectronic engineering Vol. 73-74; pp. 59 - 62
Main Authors: CHENG, W. C, LAI, F. D, HUANG, H. M, WANG, Lon A
Format: Conference Proceeding Journal Article
Language:English
Published: Amsterdam Elsevier Science 01-06-2004
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Microelectronic fabrication
Gas flow
Optical constant
Electron cyclotron resonance
Resist
PECVD
Photolithography
Antireflection coating
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Description
ISSN:0167-9317
1873-5568
DOI:10.1016/s0167-9317(04)00073-5