Influence of substrate bias on the structure and properties of TiCN films deposited by radio-frequency magnetron sputtering

• Published in: Thin solid films Vol. 616; pp. 521 - 529
• Main Authors: Saoula, N., Madaoui, N., Tadjine, R., Erasmus, R.M., Shrivastava, S., Comins, J.D.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01-10-2016
• Subjects: Corrosion resistance; Hardness; Magnetron sputtering; Raman spectroscopy; TiCN; Corrosion resistance; Magnetron sputtering; Raman spectroscopy; Hardness; TiCN
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2016.08.047

The aim of this paper is to investigate the effects of the substrate bias on the structure and properties of the TiCN thin films. The TiCN films were grown onto silicon and steel substrates by rf reactive magnetron sputtering from a pure titanium target in Ar-CH4-N2 gas mixture. Various techniques (such as X-ray diffraction, Raman spectroscopy, energy dispersive X-ray spectroscopy, nanoindentation and potentiodynamic polarization) were used to analyze the structure, phase composition, mechanical properties, and corrosion-resistance of TiCN films. Additionally, the friction and wear properties of TiCN films were investigated by sliding them against alumina ball in the air. Experimental results of the deposition rate showed a decrease from 31nm/min to 9nm/min at biased substrate voltage from Vs=0 to −100V respectively. The refractive index for the TiCxNy films was between 2.10 and 2.26, while the roughness of the films ranged from 14.2nm and 4.2nm. The film deposited at 0V was amorphous, while films at other bias voltages have a face-centered cubic structure (like NaCl type) with a preferential growth orientation of (111). It was observed that Ti and C contents increase from 38 to 52at.% and 25 to 36at.% respectively, as a function of increasing bias voltage. The results also indicate that TiCN films deposited at a substrate bias voltage of −70V had a maximum hardness of 39GPa, and exhibited better wear resistance, with minimum wear rate and lower coefficient of friction of 0.13. The hardness significantly increased from 16 to 39GPa when the bias voltage was increased from 0 to −70V and then slightly decrease to 38GPa as further increased to −100V. The minimum corrosion current density of the film was 0.0205mA/cm2 for films deposited at −70V, which is about five times less than that of the uncoated steel (0.1140mA/cm2).
•TiCN films are deposited by magnetron sputtering at different bias substrates.•Refractive indexes found for TiCN are close to those of TiO2.•TiCN structure changed from amorphous to crystalline with increasing substrate bias.•TiCN films with high hardness and high protective efficiency (82%) are demonstrated.•Corrosion resistance is affected by negative bias voltage of TiCN film.