Optimization of experimental operating parameters for very high resolution focused ion beam applications

• Published in: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Vol. 15; no. 6; pp. 2373 - 2378
• Main Authors: Gierak, J., Vieu, C., Schneider, M., Launois, H., Ben Assayag, G., Septier, A.
• Format: Conference Proceeding
• Language: English
• Published: 01-11-1997
• ISSN: 0734-211X; 1520-8567
• DOI: 10.1116/1.589650

We report an experimental procedure to optimize the current profile of a focused ion beam probe, with a special emphasis on high resolution applications. The optimized operating conditions are given for three specific cases: specimen thinning for electron microscopy, nanoetching, and nanolithography. We present high quality membranes for transmission electron microscopy, arrays of nanoholes with reproducible dimensions of 17 nm etched on a nickel membrane, and finally nanolithography operations with a 10 nm resolution. Due to the conventional design of our focused ion beam system, the operating conditions that we have established for each nanofabrication application, should be successfully applied to a wide variety of ion columns.