Electrical Characterization of Plasma-Assisted Electron Beam Source With Sub-mm Sheet Aperture

In this article, the electrical characterization of a plasma-assisted electron beam source with a sub-mm sheet aperture has been performed. The developed sheet electron beam source comprises a hollow cathode cavity, two floating anodes, and one ground potential anode with a sheet aperture of <inl...

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Bibliographic Details
Published in:IEEE transactions on electron devices Vol. 70; no. 2; pp. 771 - 775
Main Authors: Abhishek, Anand, Kumar, Niraj, Vishant, Meena, Bharat Lal, Jain, Sahil, Prabhu, Shriganesh, Mishra, Ajay, Dixit, Nimish, Khare, Sudhir
Format: Journal Article
Language:English
Published: New York IEEE 01-02-2023
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:In this article, the electrical characterization of a plasma-assisted electron beam source with a sub-mm sheet aperture has been performed. The developed sheet electron beam source comprises a hollow cathode cavity, two floating anodes, and one ground potential anode with a sheet aperture of <inline-formula> <tex-math notation="LaTeX">1.5\times0.3 </tex-math></inline-formula> mm. The source has been characterized under varying applied gap potential range, i.e., 10-30 kV in self-breakdown operating mode. The breakdown parameters and resultant beam parameters, such as <inline-formula> <tex-math notation="LaTeX">{V} - {I} </tex-math></inline-formula> characteristics, electron beam current density, duration to reach the conductive phase, and the energy transformation efficiency of the developed source, have been analyzed. The successive breakdown phenomenon has also been presented in the profile of the developed electron beam source.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2022.3231574