High index contrast mirrors for optical microcavities

• Published in: Applied physics letters Vol. 57; no. 14; pp. 1387 - 1389
• Main Authors: SENG-TIONG HO, MCCALL, S. L, SLUSHER, R. E, PFEIFFER, L. N, WEST, K. W, LEVI, A. F. J, BLONDER, G. E, JEWELL, J. L
• Format: Journal Article
• Language: English
• Published: Melville, NY American Institute of Physics 01-10-1990
• Subjects: Exact sciences and technology; Fundamental areas of phenomenology (including applications); Laser optical systems: design and operation; Optics; Physics; Resonators, cavities, amplifiers, arrays, and rings; Cavity; Growth; Dielectric materials; Epitaxy; Multiple layer; Optics; Molecular beam; Mirror
• ISSN: 0003-6951; 1077-3118
• DOI: 10.1063/1.103443

A new technique for constructing multilayer dielectric mirrors is described that results in high reflectivities with only two or three dielectric layer pairs per mirror. These structures are obtained by selectively etching layered AlxGa1−xAs material grown by molecular beam epitaxy and then replacing the etched regions with acrylic resin or air. A thin optical cavity produced by this technique is demonstrated with mirror reflectivities near 96%. These techniques allow the fabrication of lasers, light-emitting diodes, or optical switches with high contrast ratio mirrors on both sides of an optically active region in order to enhance output coupling, lower laser thresholds, and increase modulation rates.