Interface roughness correlation in tungsten/silicon multilayers

Interface roughness correlation in tungsten/silicon multilayers

X-ray reflectivity and diffuse scattering measurements at grazing incidence have been made using Cu Kα1 radiation on obliquely deposited W/Si multilayers. The specular and non-specular scans were simulated by a Fresnel optical computational code and within the distorted-wave Born approximation, resp...

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Bibliographic Details
Published in:Journal of magnetism and magnetic materials Vol. 156; no. 1-3; pp. 117 - 118
Main Authors: Jergel, M., Holý, V., Majková, E., Luby, Š., Senderák, R.
Format: Journal Article
Language:English
Published: Elsevier B.V 01-04-1996
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Summary:X-ray reflectivity and diffuse scattering measurements at grazing incidence have been made using Cu Kα1 radiation on obliquely deposited W/Si multilayers. The specular and non-specular scans were simulated by a Fresnel optical computational code and within the distorted-wave Born approximation, respectively. Rougher and vertically less correlated interfaces are evidenced with increasing deposition angle, thus revealing an increased tendency for agglomeration.
Bibliography:SourceType-Scholarly Journals-2
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ISSN:0304-8853
DOI:10.1016/0304-8853(95)00808-X