P-211L: Late-News Poster: Exploring the Pixel Density Limitations of SBS AMOLED for VR Application

Fine metal masks (FMM) have always been a critical manufacturing tool for the fabrication (SBS) AMOLED panels. In this work, we suocfc eRs/sGfu/lBly fsaibdrei‐cbayt‐esidd ae ssterruiecst uoref tOo LcEonDf irdmev itchees maanndu faacctitvuer inmga fteriaxs ipbailniteyl sw iitnh oau th uysbirnigd pFeM...

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Bibliographic Details
Published in:	SID International Symposium Digest of technical papers Vol. 47; no. 1; pp. 1805 - 1807
Main Authors:	Chen, Yu-Hung, Hsin, Meng-Hung, Chen, Yi-Chi, Su, Yi-Hao, Chen, Wen-Tai, Chen, Teng-Ke, Chen, Tsu-Wei, Yang, Shun-Ping, Lee, Chien-Ya, Lin, Hong Shen, Chen, Peng-Yu, Chen, Kuo-Kuang, Lu, Hsueh-Hsin, Lin, Yu-Hsin
Format:	Journal Article
Language:	English
Published:	Campbell Blackwell Publishing Ltd 01-05-2016 Wiley Subscription Services, Inc
Subjects:	AMOLED Density LTPS Masks Panels Photolithography Pixels R/G/B stripe Side by Side Technical papers Ultra-high Resolution
Online Access:	Get full text
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Summary:	Fine metal masks (FMM) have always been a critical manufacturing tool for the fabrication (SBS) AMOLED panels. In this work, we suocfc eRs/sGfu/lBly fsaibdrei‐cbayt‐esidd ae ssterruiecst uoref tOo LcEonDf irdmev itchees maanndu faacctitvuer inmga fteriaxs ipbailniteyl sw iitnh oau th uysbirnigd pFeMrfoMrm taonolcse. s Fharovme coomupr ateixbplee rliifme‐etnimtael trdeantad,s aanlld othfe tshaem ed eJvVicBe characteristics after photolithography process.
Bibliography:	istex:154D3B916CB9046E1E1FF06B95C0FBE1CC805DA3 ArticleID:SDTP11074 ark:/67375/WNG-CS71JSCB-R ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23
ISSN:	0097-966X 2168-0159
DOI:	10.1002/sdtp.11074