Annealing effects on the hardening of electroless plated Ni–P layer by boron implantation

Annealing effects of hardening of electroless plated Ni-P layer on an iron based alloy have been studied in connection with 200 keV boron ion implantation at a dose of 1mult10 exp 17 ions/cm exp 2 . Increases of Vickers hardness in the near-surface region were observed to an extent of 17% for the pr...

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Published in:Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms Vol. 145; no. 3; pp. 391 - 394
Main Authors: Hanamoto, K., Sasaki, M., Miyashita, T., Kido, Y., Nakayama, Y., Kawamoto, Y., Fujiwara, M., Kaigawa, R.
Format: Journal Article
Language:English
Published: 01-11-1998
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Summary:Annealing effects of hardening of electroless plated Ni-P layer on an iron based alloy have been studied in connection with 200 keV boron ion implantation at a dose of 1mult10 exp 17 ions/cm exp 2 . Increases of Vickers hardness in the near-surface region were observed to an extent of 17% for the pre-annealed specimens compared to unimplanted ones. Post-annealed specimens did not show effective hardening by the implantation treatment. The chemical states of implanted ions were studied by x-ray photoelectron spectroscopy (XPS) and the results may suggest that the increase of hardness is not due to the precipitation of nickel borides, but rather due to amorphization of Ni and Ni sub 3 P.
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ISSN:0168-583X
DOI:10.1016/S0168-583X(98)00419-4