Molecular beam epitaxy of Ru2Si3 on silicon

Saved in:

Bibliographic Details
Published in:	Thin solid films Vol. 371; no. 1-2; pp. 66 - 71
Main Authors:	LENSSEN, D, LENK, S, BAY, H. L, MANTL, S
Format:	Journal Article
Language:	English
Published:	Lausanne Elsevier Science 01-08-2000
Subjects:	Cross-disciplinary physics: materials science; rheology Exact sciences and technology Materials science Methods of deposition of films and coatings; film growth and epitaxy Molecular, atomic, ion, and chemical beam epitaxy Physics Atomic force microscopy RBS Inorganic compounds Epitaxial layers Ruthenium silicides Transition element compounds Crystal growth from vapors Experimental study Thin films Growth mechanism Molecular beam epitaxy Heteroepitaxy SEM TEM
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!

Description
ISSN:	0040-6090 1879-2731
DOI:	10.1016/S0040-6090(00)01006-3