Reaction kinetics of H2O with chlorinated Si(111)-(7×7) and porous silicon surfaces

Reaction kinetics of H2O with chlorinated Si(111)-(7×7) and porous silicon surfaces

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Bibliographic Details
Published in:Surface science Vol. 364; no. 3; pp. 367 - 379
Main Authors: WISE, M. L, SNEH, O, OKADA, L. A, GEORGE, S. M
Format: Journal Article
Language:English
Published: Lausanne Elsevier Science 01-09-1996
Amsterdam
New York, NY
Subjects:
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Vapor phase epitaxy; growth from vapor phase
Characterization
Thin films
Crystal growth
Atomic layer method
Chlorine
Surface reactions
Silicon oxides
Epitaxy
Porous materials
Experimental study
Preadsorption
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Description
ISSN:0039-6028
1879-2758
DOI:10.1016/0039-6028(96)00595-X