Processing of vacuum microelectronic devices by focused ion and electron beams

• Published in: Applied physics. A, Materials science & processing Vol. 76; no. 7; pp. 1007 - 1012
• Main Authors: Takai, M., Jarupoonphol, W., Ochiai, C., Yavas, O., Park, Y.K.
• Format: Journal Article
• Language: English
• Published: 01-05-2003
• Subjects: Arrays; Beams (radiation); Chemical reactions; Electron beams; Finite element method; Leakage current; Prototyping; Repairing
• ISSN: 0947-8396; 1432-0630
• DOI: 10.1007/s00339-002-1941-3

Localized physical and chemical reactions induced by focused ion and electron beams, i.e. dual beams, have been used to fabricate field emitters (FEs) and their arrays, field-emitter arrays (FEAs), without masking and annealing processes. Issues arising from beam processing such as beam-induced damage and contamination were eliminated to provide FEAs with low leakage current. Quick prototyping and repairing processes of FEs and FEAs using dual-beam processing have been demonstrated.