Equations of exposure time and X-ray mask absorber thickness in the LIGA process

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Bibliographic Details
Published in:	Microsystem technologies : sensors, actuators, systems integration Vol. 7; no. 1; pp. 1 - 5
Main Authors:	GIL, K. H, LEE, S. S, YOUM, Y
Format:	Journal Article
Language:	English
Published:	Berlin Springer 01-03-2001
Subjects:	Exact sciences and technology Instruments, apparatus, components and techniques common to several branches of physics and astronomy Mechanical instruments, equipment and techniques Micromechanical devices and systems Physics Power density Electroforming Precision engineering Photons Masks Micromechanical devices X-ray lithography PMMA Three dimensional structure Attenuation coefficient Resists X radiation Miniaturization Exposure time Microstructure Synchrotron radiation
Online Access:	Get full text
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Description
ISSN:	0946-7076 1432-1858
DOI:	10.1007/s005420000062