Mass spectrometric study of NF3 plasma etching of silicon

Mass spectrometric study of NF3 plasma etching of silicon

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Bibliographic Details
Published in:Plasma chemistry and plasma processing Vol. 10; no. 4; pp. 571 - 587
Main Authors: PERRIN, J, MEOT, J, SIEFERT, J.-M, SCHMITT, J
Format: Journal Article
Language:English
Published: New York, NY Springer 01-12-1990
Subjects:
Chemistry
Exact sciences and technology
Inorganic chemistry and origins of life
Kinetics and mechanism of reactions
Plasma
Mass spectrum
Etching
Online Access:Get full text
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Description
ISSN:0272-4324
1572-8986
DOI:10.1007/BF01447265