Chemical vapor deposition of refractory metals from fluoride gases

Chemical vapor deposition of refractory metals from fluoride gases

The kinetics of the chemical vapor deposition of Group V (V, Nb, Ta), VI (Mo, W), and VII (Re) transition metals from fluoride-hydrogen mixtures were studied. The major steps of the deposition process were established. The deposition rate is shown to correlate with the thermodynamic probability of h...

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Bibliographic Details
Published in:Inorganic materials Vol. 36; no. 5; pp. 454 - 457
Main Authors: Lakhotkin, Yu. V., Kuz’min, V. P., Rybkina, T. I., Kovalev, A. B.
Format: Journal Article
Language:English
Published: New York Springer Nature B.V 01-05-2000
Subjects:
Chemical vapor deposition
Hydrogen reduction
Molybdenum
Refractory metals
Transition metals
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Summary:The kinetics of the chemical vapor deposition of Group V (V, Nb, Ta), VI (Mo, W), and VII (Re) transition metals from fluoride-hydrogen mixtures were studied. The major steps of the deposition process were established. The deposition rate is shown to correlate with the thermodynamic probability of hydrogen reduction. The effect of intermediate products on the deposition rate of 3d and 4d transition metals is assessed.
ISSN:0020-1685
1608-3172
DOI:10.1007/BF02758046